Advanced Microscale and Nanoscale Fabrication.

Catalog description

Semester course; 3 lecture hours. 3 credits. Prerequisite: EGRE 435 with a minimum grade of C. This course presents a detailed analysis of the physics and modeling of the fundamental processes used in semiconductor processing. Emphasis is placed on the non-ideal effects that cause realistic processes to deviate from first order models, including second order effects such as interactions on the atomic level and the influence of crystal defects. Processes covered in detail include oxidation, diffusion, ion implementation, thin film deposition and plasma etching techniques.