Advanced Lithography and Dielectrics Nanofabrication - NMT 314

Catalog description

This course covers all aspects of lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the lithographic process from substrate preparation to exposure. The second section examines the processes from development through inspection (both before and after pattern transfer). This section introduces optical masks, aligners, steppers and scanners. In addition, critical dimension (CD) and profile control of photoresists are investigated. The last section discusses advances in optical lithographic techniques such as phase shifting masks and illumination schemes as well as molecular ruler, e-beam, x-ray, EUV, and ion beam lithography. Students with a semester level of Freshman 1, Freshman 2 or Sophomore 1 may not enroll.