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Rose-Hulman Institute of Technology · 4 credits · UGRD

Section information text: Fabrication and characterization of micro/nanoelectronic devices; Process integration of various technologies, including CMOS, 2D materials, and nanowires; Surface processing for improved performance, including passivation, anti-reflection structures, and protective coatings. Process and device simulators illustrate concepts introduced in class. Laboratory is an integral component of this class in which students will fabricate a multi-junction semiconductor device. In-process measurement results are compared with final electrical test results and simulated designs.
Fall 2026 · 1 section
Sep 3 – Nov 19
| Section | Days & time | Location | Instructor |
|---|---|---|---|
| 01Class #1495 | Mo Th · 2:00 – 4:50 PMTu Fr · 4:00 – 4:50 PM | Myers Hall M138Olin Hall O101 | Marincel, Dan |
| 01 notes: Instructional method: Lecture | |||