Metrology for Failure Analysis and Yield of ICs

Catalog description

Successful IC manufacturing must detect defects (the non-idealities) that occur in a process), eliminate those defects that preclude functional devices (yield enhancement), and functionality for up to ten years of use in the field (reliability). Course surveys current CMOS manufacturing to compile a list of critical parameters and steps to monitor during manufacturing. This survey is followed with an in depth look at the theory and instrumentation of the tools utilized to monitor these parameters. Tool set includes optical instrumentation, electron microscopy, surface analysis techniques, and electrical measurements. Case studies from industry and prior students are reviewed. Students are required to perform a project either exploring a technique not covered in class, or to apply their course knowledge to a practical problem.