MT 240

RF Plasma Systems

Portland Community College · UGRD · Fall 2026

1 section

Catalog description

Covers the theory and practice of RF (Radio Frequency) plasma systems as used in semiconductor manufacturing processes such as etching, chemical vapor deposition (CVD) and sputter deposition. Includes plasma physics, RF power system components, power matching and match circuits, and applications in semiconductor manufacturing. Prerequisite: MT 112A or MT 112, MT 223 , CH 100 or higher, WR 227Z , or instructor permission. Audit available.

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Class #portland-MT240Fall 2026UGRD3 credits

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Instructor: Staff

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