Pattern Transfer at the Nano-scale

Catalog description

Engineering at the nano-scale often requires creating and then transferring a pattern when fabricating a desired nano-scale structure. This course explores the basic processes of pattern design and then addresses the techniques used to transfer a nano-scale pattern to a surface or structure. The course looks into pattern transfer techniques that employ particles, photons, and additional chemical and physical means as the transfer mechanisms. Included in the photon approaches are studies of deep UV and X-ray pattern transfer. Particle transfer mechanisms discussed include ion and neutral particle approaches. Physical-contact pattern transfer is also explored including discussions of nano-imprinting lithography, nano-molding lithography, and scanning probe lithography. Chemical pattern transfer is another approach to pattern transfer and one that uniquely uses chemical processes to create patterns. Examples to be discussed in this course include molecular self-assembly lithography and block co-polymer lithography. Emerging pattern transfer techniques, such as magneto-lithography, will be included in E SC 521 for completeness. In many of these pattern transfer methodologies, a "writing" of the transferring pattern into some intermediary medium termed a resist is required. In pattern technologies requiring resists, the resist materials and their positioning as well as required physical and chemical properties will be discussed.