Nanofabrication and Characterization of Electronics

Catalog description

This course will give an introduction to modern nanofabrication technologies with emphasis on integrated circuits manufacturing. Thermal budget, scaling of geometry, pitch and registry and control of parametric yield will be used for integration guidelines. Physical principles and process modeling will be covered in lectures and labs will include a series of fabrication steps of lithography, metallization, plasma etching and annealing to produce semiconductor devices (Schottky diodes, pn junction diodes, MOS capacitors, and MOSFETs). Recent advances in nanofabrication will be briefly reviewed for their possible technology insertion and main integration challenges.