Microfabrication

Catalog description

This class covers basic microfabrication processes for semiconductor and VLSI fabrication, including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vaporphase epitaxial growth, sputtering, and CVD. Advanced processing topics such as next generation lithography, MBE and metal organic CVD are also introduced. The physics and chemistry of each process are introduced along with descriptions of the equipment used for the manufacture of integrated circuits. The integration of microfabrication process into CMOS, bipolar, and MEMS technologies are also discussed. The purpose of this course is to provide students with technical background and knowledge in silicon microelectronic fabrication process. Upon finishing this course, students will be familiar with the basic semiconductor and VLSI microfabrication processes.