Light Optics for Nanoengineering

Catalog description

Applied optics for nanoscale patterning and metrology. Paraxial optics, lens makers equation, 3rd order optics, Seidel aberrations, Zernike polynomials, compound systems, numerical aperture, diffraction limit. Specific examples applied to lithography using 193nm immersion and EUV techniques. Optical specifications for patterning and metrology equipment including economic tradeoffs are covered as well as techniques for optical resolution enhancement. May be taken concurrently with I NEN 441.